Acids and Bases

Ammonium Fluoride

High purity wet etching agent, primarily used in buffered oxide etchant formulations

Bottle

High purity, CMOS, Technical grade

Chip Manufacturing

Ammonium Hydroxide

Wet chemistry etching agent used in the electronics industry for etching circuit boards.

Bottle

High purity, CMOS, Finyte, Technical grade

Chip Manufacturing

Hydrochloric Acid

High purity wet etching agent, used in a variety of semiconductor applications, such as removal of residue trace metals

Bottles, Pail, Drums

High purity, CMOS, VLSI, SEMI, Technical grade

Chip Manufacturing

Hydrofluoric Acid

Used for silicon etching, as well as in buffered oxide etchant formulations.

Bottle, Pail, Drum

High purity, Low etals, Technical grade

Chip Manufacturing

Hydrogen Peroxide

Hydrogen peroxide is used a mixture with ammonium hydroxide to removes organic matter and particles from silicon wafers. It is also used a formulated mixture of hydrogen peroxide and HCL to removes residual trace metals

Bottle, Drums

High purity, CMOS, Technical grade

Chip Manufacturing

Nitric Acid

Used as a chemical doping agent for organic semiconductors

Bottles, Drums

High purity, CMOS, VLSI, SEMI, Technical grade

Chip Manufacturing

Phosphoric Acid

Wet etchant agent used in silicone nitride etching and aluminum etching.

Bottles

High purity, CMOS, VLSI, Technical grade

Chip Manufacturing

Potassium Hydroxide

Potassium Hydroxide solutions are used to etch silicon wafers to produce structures in the silicon

Bottles, Bag, Drum

High purity, CMOS, Technical grade

Chip Manufacturing

Sodium Hydroxide

Wet etching agent used to attack the silicon during the etching process

Bottles, Drums

High purity, CMOS, Technical grade

Chip Manufacturing

Sulfuric Acid (Electronic)

Used in cleaning and etching applications of silicon wafers

Bottle, Pail, Drum

High purity, CMOS, SEMI, Finyte, Technical grade

Chip Manufacturing